The direct nano-patterning of ZnO using nanoimprint lithography with ZnO-sol and thermal annealing
DC Field | Value | Language |
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dc.contributor.author | Yang, Ki-Yeon | - |
dc.contributor.author | Yoon, Kyung-Min | - |
dc.contributor.author | Choi, Kyung-Woo | - |
dc.contributor.author | Lee, Heon | - |
dc.date.accessioned | 2021-09-08T12:06:22Z | - |
dc.date.available | 2021-09-08T12:06:22Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2009-11 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/119039 | - |
dc.description.abstract | Nano-patterned ZnO layer was fabricated by ZnO-sol imprinting with a polymeric mold, followed by annealing. instead of polymer based imprint resin, ZnO-sol was used as an imprint resin. During the imprinting process, the organic solvent in the ZnO-sol was absorbed into a polymeric mold and thus, ZnO-sol was converted to ZnO-gel. These patterns were subsequently annealed at 650 degrees C for 1 h in atmospheric ambient to form ZnO patterns. X-ray diffraction (XRD) and photoluminescence (PL) confirmed that ZnO-gel was completely converted into ZnO by annealing. Using this ZnO-sol imprinting method, ZnO nano-patterns, as small as 50 nm. were fabricated on Si and oxidized Si wafer substrates. The ZnO nano-patterns were characterized using scanning electron microscopy (SEM) and Transmission electron microscopy (TEM). (C) 2009 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.title | The direct nano-patterning of ZnO using nanoimprint lithography with ZnO-sol and thermal annealing | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1016/j.mee.2009.03.078 | - |
dc.identifier.scopusid | 2-s2.0-69749101533 | - |
dc.identifier.wosid | 000271363900016 | - |
dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.86, no.11, pp.2228 - 2231 | - |
dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
dc.citation.title | MICROELECTRONIC ENGINEERING | - |
dc.citation.volume | 86 | - |
dc.citation.number | 11 | - |
dc.citation.startPage | 2228 | - |
dc.citation.endPage | 2231 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordAuthor | ZnO nano-pattern | - |
dc.subject.keywordAuthor | ZnO-sol | - |
dc.subject.keywordAuthor | ZnO-gel | - |
dc.subject.keywordAuthor | Nanoimprint lithography | - |
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