The direct nano-patterning of ZnO using nanoimprint lithography with ZnO-sol and thermal annealing
- Authors
- Yang, Ki-Yeon; Yoon, Kyung-Min; Choi, Kyung-Woo; Lee, Heon
- Issue Date
- 11월-2009
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- ZnO nano-pattern; ZnO-sol; ZnO-gel; Nanoimprint lithography
- Citation
- MICROELECTRONIC ENGINEERING, v.86, no.11, pp.2228 - 2231
- Indexed
- SCIE
SCOPUS
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 86
- Number
- 11
- Start Page
- 2228
- End Page
- 2231
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/119039
- DOI
- 10.1016/j.mee.2009.03.078
- ISSN
- 0167-9317
- Abstract
- Nano-patterned ZnO layer was fabricated by ZnO-sol imprinting with a polymeric mold, followed by annealing. instead of polymer based imprint resin, ZnO-sol was used as an imprint resin. During the imprinting process, the organic solvent in the ZnO-sol was absorbed into a polymeric mold and thus, ZnO-sol was converted to ZnO-gel. These patterns were subsequently annealed at 650 degrees C for 1 h in atmospheric ambient to form ZnO patterns. X-ray diffraction (XRD) and photoluminescence (PL) confirmed that ZnO-gel was completely converted into ZnO by annealing. Using this ZnO-sol imprinting method, ZnO nano-patterns, as small as 50 nm. were fabricated on Si and oxidized Si wafer substrates. The ZnO nano-patterns were characterized using scanning electron microscopy (SEM) and Transmission electron microscopy (TEM). (C) 2009 Elsevier B.V. All rights reserved.
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Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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