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Effect of nano-patterning of p-GaN cladding layer on photon extraction efficiency

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dc.contributor.authorHong, Eun-Ju-
dc.contributor.authorByeon, Kyeong-Jae-
dc.contributor.authorPark, Hyoungwon-
dc.contributor.authorHwang, Jaeyeon-
dc.contributor.authorLee, Heon-
dc.contributor.authorChoi, Kyungwoo-
dc.contributor.authorKim, Hyeong-Seok-
dc.date.accessioned2021-09-08T13:05:13Z-
dc.date.available2021-09-08T13:05:13Z-
dc.date.created2021-06-11-
dc.date.issued2009-10-
dc.identifier.issn0038-1101-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/119224-
dc.description.abstractVarious sized nano-patterns, ranging from 0.8 mu m x 0.4 mu m to 2.0 mu m x 1.0 mu m were formed on the p-GaN top cladding layer of green LED, in order to increase photon extraction efficiency by suppressing total internal reflection. Fabrication of nano-patterns was done by UV nanoimprint lithography and reactive ion etching of p-GaN using SiCl4 and At gases using SiO2 as an etch mask. The effect of various nano-patterns on top p-GaN layer was investigated by photoluminescence. Compared to LED structure without nano-patterns on top cladding layer, the LED structures with sub-micron sized nano-patterns exhibit up to four times stronger emission intensity. This implies that the photon extraction efficiency of LED structures was increased by nano-patterns on top p-GaN layer. However, the luminescence intensity of LED structures with patterns greater than a micron, was less increased. (C) 2009 Elsevier Ltd. All rights reserved.-
dc.languageEnglish-
dc.language.isoen-
dc.publisherPERGAMON-ELSEVIER SCIENCE LTD-
dc.subjectLIGHT-EMITTING-DIODES-
dc.subjectDRY-ETCH DAMAGE-
dc.subjectNANOIMPRINT LITHOGRAPHY-
dc.subjectRECOVERY-
dc.subjectPERFORMANCE-
dc.subjectIMPROVEMENT-
dc.subjectINTENSITY-
dc.titleEffect of nano-patterning of p-GaN cladding layer on photon extraction efficiency-
dc.typeArticle-
dc.contributor.affiliatedAuthorLee, Heon-
dc.identifier.doi10.1016/j.sse.2009.05.007-
dc.identifier.scopusid2-s2.0-68349125558-
dc.identifier.wosid000270161500007-
dc.identifier.bibliographicCitationSOLID-STATE ELECTRONICS, v.53, no.10, pp.1099 - 1102-
dc.relation.isPartOfSOLID-STATE ELECTRONICS-
dc.citation.titleSOLID-STATE ELECTRONICS-
dc.citation.volume53-
dc.citation.number10-
dc.citation.startPage1099-
dc.citation.endPage1102-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusLIGHT-EMITTING-DIODES-
dc.subject.keywordPlusDRY-ETCH DAMAGE-
dc.subject.keywordPlusNANOIMPRINT LITHOGRAPHY-
dc.subject.keywordPlusRECOVERY-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusIMPROVEMENT-
dc.subject.keywordPlusINTENSITY-
dc.subject.keywordAuthorNano-pattern-
dc.subject.keywordAuthorGaN-
dc.subject.keywordAuthorPhoton extraction efficiency-
dc.subject.keywordAuthorGreen LED-
dc.subject.keywordAuthorPhotoluminescence-
dc.subject.keywordAuthorNanoimprint lithography-
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공과대학 (신소재공학부)
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