N-channel thin-film transistors constructed on plastic by solution processes of HgSe nanocrystals
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jang, Jaewon | - |
dc.contributor.author | Cho, Kyoungah | - |
dc.contributor.author | Yun, Junggwon | - |
dc.contributor.author | Kim, Sangsig | - |
dc.date.accessioned | 2021-09-08T13:13:14Z | - |
dc.date.available | 2021-09-08T13:13:14Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2009-10 | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/119246 | - |
dc.description.abstract | We demonstrate bottom-gate thin-film transistors (TFTs) based on solution-processed HgSe nanocrystals (NCs) on plastic substrates. Solid films made of spin-coated HgSe NCs were heated at a temperature of 150 degrees C for 15 min to maximize the magnitude of their current, and these films were utilized as the channel layers of TFTs. A representative TFT with a bottom-gate Al2O3 layer operated as a depletion-mode one with an n-channel, exhibiting a field effect mobility of 3.9 cm(2)/VS and an on/off current ratio of about 10(2). In addition, the electrical characteristics of the TFT on bent substrates are briefly described. (C) 2009 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | FIELD-EFFECT TRANSISTORS | - |
dc.subject | GATE DIELECTRICS | - |
dc.subject | QUANTUM DOTS | - |
dc.subject | SIZE | - |
dc.title | N-channel thin-film transistors constructed on plastic by solution processes of HgSe nanocrystals | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Cho, Kyoungah | - |
dc.contributor.affiliatedAuthor | Kim, Sangsig | - |
dc.identifier.doi | 10.1016/j.mee.2009.01.027 | - |
dc.identifier.scopusid | 2-s2.0-67649998638 | - |
dc.identifier.wosid | 000268552700011 | - |
dc.identifier.bibliographicCitation | MICROELECTRONIC ENGINEERING, v.86, no.10, pp.2030 - 2033 | - |
dc.relation.isPartOf | MICROELECTRONIC ENGINEERING | - |
dc.citation.title | MICROELECTRONIC ENGINEERING | - |
dc.citation.volume | 86 | - |
dc.citation.number | 10 | - |
dc.citation.startPage | 2030 | - |
dc.citation.endPage | 2033 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | FIELD-EFFECT TRANSISTORS | - |
dc.subject.keywordPlus | GATE DIELECTRICS | - |
dc.subject.keywordPlus | QUANTUM DOTS | - |
dc.subject.keywordPlus | SIZE | - |
dc.subject.keywordAuthor | HgSe nanocrystals | - |
dc.subject.keywordAuthor | Thin-film transistor | - |
dc.subject.keywordAuthor | UV/ozone treatment | - |
dc.subject.keywordAuthor | Flexible device | - |
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