Electrical contact properties of Cu2S nanowires grown vertically on Cu foil by gas-solid reaction
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lim, Youngseok | - |
dc.contributor.author | Ok, Young-Woo | - |
dc.contributor.author | Tark, Sung-Ju | - |
dc.contributor.author | Kang, Yoonmook | - |
dc.contributor.author | Kim, Donghwan | - |
dc.date.accessioned | 2021-09-08T13:44:35Z | - |
dc.date.available | 2021-09-08T13:44:35Z | - |
dc.date.created | 2021-06-11 | - |
dc.date.issued | 2009-09 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/119349 | - |
dc.description.abstract | We grew Cu2S nanowires vertically on Cu foil by gas-solid reaction with a gas mixture of O-2 and H2S. The electrical contact properties between the Cu2S nanowires and Cu foil were investigated using a modified current-voltage-temperature plot. The Cu/Cu2S layer exhibited the characteristics of a Schottky barrier with a barrier height of similar to 0.72 eV, which was closer to the value for Cu/Cu2O than to Cu/Cu2S. Energy dispersive spectroscopy results showed the presence of Cu-oxide between the Cu2S nanowires and Cu foil. The overall structure was Cu/Cu-oxide/Cu2S and the electrical properties were controlled by the Cu/Cu-oxide. (C) 2008 Elsevier B.V. All rights reserved. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | HIGH SERIES RESISTANCE | - |
dc.subject | SCHOTTKY DIODES | - |
dc.subject | IV PLOT | - |
dc.subject | ARRAYS | - |
dc.title | Electrical contact properties of Cu2S nanowires grown vertically on Cu foil by gas-solid reaction | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kang, Yoonmook | - |
dc.contributor.affiliatedAuthor | Kim, Donghwan | - |
dc.identifier.doi | 10.1016/j.cap.2008.08.035 | - |
dc.identifier.scopusid | 2-s2.0-67349159372 | - |
dc.identifier.wosid | 000266613500002 | - |
dc.identifier.bibliographicCitation | CURRENT APPLIED PHYSICS, v.9, no.5, pp.890 - 893 | - |
dc.relation.isPartOf | CURRENT APPLIED PHYSICS | - |
dc.citation.title | CURRENT APPLIED PHYSICS | - |
dc.citation.volume | 9 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 890 | - |
dc.citation.endPage | 893 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.identifier.kciid | ART001376326 | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | HIGH SERIES RESISTANCE | - |
dc.subject.keywordPlus | SCHOTTKY DIODES | - |
dc.subject.keywordPlus | IV PLOT | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordAuthor | Cu2S | - |
dc.subject.keywordAuthor | Nanowire | - |
dc.subject.keywordAuthor | Schottky | - |
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