Low Temperature Fabrication of Residue-Free Polymer Patterns on Flexible Polymer Substrate
- Authors
- Yang, Ki-Yeon; Yoon, Kyung-Min; Kim, Jong-Woo; Lee, Jong-Hwa; Lee, Heon
- Issue Date
- 9월-2009
- Publisher
- IOP PUBLISHING LTD
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.9
- Indexed
- SCIE
SCOPUS
- Journal Title
- JAPANESE JOURNAL OF APPLIED PHYSICS
- Volume
- 48
- Number
- 9
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/119418
- DOI
- 10.1143/JJAP.48.095003
- ISSN
- 0021-4922
- Abstract
- Low temperature imprinting on various substrates is essential for applying nanoimprint lithography (NIL) to the patterning process of large-area substrates with low thermal resistance. In addition, the imprinting resist must be distributed uniformly over a large area with near-zero residue imprinting to reduce the level of pattern damage during the residue removal process. In this study, thermal imprinting with a poly(benzyl methacrylate) (PBMA) resist, which can be coated uniformly over a large-area substrate by spin-coating and imprinted at low temperatures, was used to form micro- to nano-sized patterns. The PBMA patterns with a near-zero residual layer could be formed on the substrate using the partial-filling method. Using this imprinting technique, nano-sized PBMA patterns with a minimized residual layer were transferred to a Si wafer and poly(ethylene terephthalate) (PET) film with dimensions 50 x 50 mm(2). Metal patterns, as small as 70 nm, were fabricated on the substrate using this imprinting and lift-off process. (C) 2009 The Japan Society of Applied Physics
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Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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