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The improved performance of a transparent ZnO thin-film transistor with AlN/Al2O3 double gate dielectrics

Authors
Lee, Jung-MinChoi, Byung-HyunJi, Mi-JungPark, Jung-HoKwon, Jae-HongJu, Byeong-Kwon
Issue Date
May-2009
Publisher
IOP PUBLISHING LTD
Keywords
Thin film transistor; Oxide TFT; ZnO
Citation
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.24, no.5
Indexed
SCIE
SCOPUS
Journal Title
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume
24
Number
5
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/120182
DOI
10.1088/0268-1242/24/5/055008
ISSN
0268-1242
Abstract
This paper reports on the fabrication of stable and improved performance of transparent ZnO thin-film transistors (TFTs) with AlN/Al2O3 double gate dielectrics. AlN films reduce the surface roughness of the channel/dielectric interface due to an excellent lattice match with the ZnO film. Al2O3 films, which have a large band offset between the channel layers, are helpful to reduce the gate leakage current. Good device characteristics have been obtained from the AlN/Al2O3 TFT with a field effect mobility of 4.3 cm(2) V-1 s(-1), an on-off current ratio of 2 x 10(5) and a sub-threshold slope of 0.45 V/decade. By diminishing the charge trap density in the interface, the threshold voltage change from the hysteresis of the transfer characteristics was minimized to 0.3 V. These results should increase the prospects of using transparent TFTs for flat panel display applications.
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