Fabrication of Moth-Eye Structure on Glass by Ultraviolet Imprinting Process with Polymer Template
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Bae, Byeong-Ju | - |
dc.contributor.author | Hong, Sung-Hoon | - |
dc.contributor.author | Hong, Eun-Ju | - |
dc.contributor.author | Lee, Heon | - |
dc.contributor.author | Jung, Gun-young | - |
dc.date.accessioned | 2021-09-08T21:13:23Z | - |
dc.date.available | 2021-09-08T21:13:23Z | - |
dc.date.created | 2021-06-10 | - |
dc.date.issued | 2009-01 | - |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/120864 | - |
dc.description.abstract | An antireflection moth-eye structure was fabricated on a glass substrate by ultraviolet nanoimprint lithography (UV-NIL). A Ni template with an artificial conical structure was fabricated by laser interference lithography an used as a stamp for embossing. A transparent PVC template was fabricated by hot embossing. The embossed poly(vinyl chloride) (PVC) film was then used as an imprint template after depositing SiO2 and a self-assembled monolayer (SAM). Using the embossed PVC film as a UV-NIL stamp, a polymer based moth-eye structure was formed on the glass template and its transmittance, parallel to surface normal, was increased to 93% for a single side patterned and 97% for a double side patterned. However, at wavelengths shorter than 430 nm, the transmittance of 30 degrees-rotated glass substrate with a moth-eye structure became lower than that of the bare glass substrate, while the transmittance was not changed for longer wavelength regions. (C) 2009 The Japan Society of Applied Physics | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Fabrication of Moth-Eye Structure on Glass by Ultraviolet Imprinting Process with Polymer Template | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Lee, Heon | - |
dc.identifier.doi | 10.1143/JJAP.48.010207 | - |
dc.identifier.scopusid | 2-s2.0-59649100256 | - |
dc.identifier.wosid | 000264013500007 | - |
dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.1 | - |
dc.relation.isPartOf | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.citation.volume | 48 | - |
dc.citation.number | 1 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.