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Organization of Pentacene Molecules on Anisotropic Ultrathin HfO2/Al2O3 Templates for Organic Thin-Film Transistors Using an Ion-Beam Treatment

Authors
Kim, Young-HwanKwon, Jae-HongShin, Sang-IlOh, Byeong-YunPark, Hong-GyuPaek, Kyeong-KapJu, Byeong-KwonSeo, Dae-Shik
Issue Date
2009
Publisher
ELECTROCHEMICAL SOC INC
Keywords
alumina; hafnium compounds; ion beam effects; organic field effect transistors; organic semiconductors; permittivity; semiconductor thin films; sublimation; thin film transistors; X-ray diffraction; X-ray photoelectron spectra
Citation
ELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.8, pp.H305 - H308
Indexed
SCIE
SCOPUS
Journal Title
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume
12
Number
8
Start Page
H305
End Page
H308
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/120933
DOI
10.1149/1.3148274
ISSN
1099-0062
Abstract
This article investigates improving organic thin-film transistor (OTFT) characteristics by using an alignable high dielectric constant film to control the self-organization of pentacene molecules. The process, based on the growth of a pentacene film with high vacuum sublimation, is a method of self-organization that uses ion-beam (IB) bombardment of the HfO2/Al2O3 surface that serves as the gate dielectric layer. X-ray photoelectron spectroscopy indicates that the IB increases the structural anisotropy of the HfO2/Al2O3 film, and X-ray diffraction patterns show that increasing the anisotropy may lead to the self-organization of pentacene molecules in the first polarized monolayer. An effective mobility of 2.3x10(-3) cm(2) V-1 s(-1) was achieved, which is significantly different from the mobility in pentacene films that are not aligned. The proposed OTFT devices with an ultrathin HfO2 structure as the gate dielectric layer were operated at a gate voltage lower than 5 V.
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공과대학 (전기전자공학부)
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