Enhanced field emission properties of vertically aligned double-walled carbon nanotube arrays
DC Field | Value | Language |
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dc.contributor.author | Chen, Guohai | - |
dc.contributor.author | Shin, Dong Hoon | - |
dc.contributor.author | Iwasaki, Takayuki | - |
dc.contributor.author | Kawarada, Hiroshi | - |
dc.contributor.author | Lee, Cheol Jin | - |
dc.date.accessioned | 2021-09-09T03:36:30Z | - |
dc.date.available | 2021-09-09T03:36:30Z | - |
dc.date.created | 2021-06-10 | - |
dc.date.issued | 2008-10-15 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/122552 | - |
dc.description.abstract | Vertically aligned double-walled carbon nanotube (VA-DWCNT) arrays were synthesized by point-arc microwave plasma chemical vapor deposition on Cr/n-Si and SiO2/n-Si substrates. The outer tube diameters of VA-DWCNTs are in the range of 2.5 -3.8 nm, and the average interlayer spacing is approximately 0.42 nm. The field emission properties of these VA-DWCNTs were studied. It was found that a VA-DWCNT array grown on a Cr/n-Si substrate had better field emission properties as compared with a VA-DWCNT array grown on a SiO2/n-Si substrate and randomly oriented DWCNTs, showing a turn-on field of about 0.85 V mu m(-1) at the emission current density of 0.1 mu A cm(-2) and a threshold field of 1.67 V mu m(-1) at the emission current density of 1.0 mA cm(-2). The better field emission performance of the VA-DWCNT array was mainly attributed to the vertical alignment of DWCNTs on the Cr/n-Si substrate and the low contact resistance between CNTs and the Cr/n-Si substrate. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.subject | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject | CATALYTIC DECOMPOSITION | - |
dc.subject | CONTACT RESISTANCE | - |
dc.subject | FILMS | - |
dc.subject | GROWTH | - |
dc.subject | CATHODE | - |
dc.subject | SUBSTRATE | - |
dc.subject | EMITTERS | - |
dc.title | Enhanced field emission properties of vertically aligned double-walled carbon nanotube arrays | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Shin, Dong Hoon | - |
dc.contributor.affiliatedAuthor | Lee, Cheol Jin | - |
dc.identifier.doi | 10.1088/0957-4484/19/41/415703 | - |
dc.identifier.scopusid | 2-s2.0-56349159592 | - |
dc.identifier.wosid | 000258947100020 | - |
dc.identifier.bibliographicCitation | NANOTECHNOLOGY, v.19, no.41 | - |
dc.relation.isPartOf | NANOTECHNOLOGY | - |
dc.citation.title | NANOTECHNOLOGY | - |
dc.citation.volume | 19 | - |
dc.citation.number | 41 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordPlus | CHEMICAL-VAPOR-DEPOSITION | - |
dc.subject.keywordPlus | CATALYTIC DECOMPOSITION | - |
dc.subject.keywordPlus | CONTACT RESISTANCE | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | CATHODE | - |
dc.subject.keywordPlus | SUBSTRATE | - |
dc.subject.keywordPlus | EMITTERS | - |
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