Influence of Ar and NH3 Plasma Treatment on Surface of Poly(monochloro-para-xylylene) Dielectric Films Processed in Oxygen Plasma
- Authors
- Shutov, Dmitriy A.; Kang, Seung-Youl; Baek, Kyu-Ha; Suh, Kyung Soo; Kwon, Kwang-Ho
- Issue Date
- 8월-2008
- Publisher
- IOP PUBLISHING LTD
- Keywords
- parylene-C; surface; recovering; plasma; oxygen; argon; ammonia
- Citation
- JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.8, pp.6970 - 6973
- Indexed
- SCIE
SCOPUS
- Journal Title
- JAPANESE JOURNAL OF APPLIED PHYSICS
- Volume
- 47
- Number
- 8
- Start Page
- 6970
- End Page
- 6973
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/122920
- DOI
- 10.1143/JJAP.47.6970
- ISSN
- 0021-4922
- Abstract
- The surface of the poly(monochloro-para-xylylene) (parylene-C) films after O-2 plasma and successive Ar and NH3 plasma treatment was investigated using a contact angle and an X-ray photoelectron spectroscopy (XPS) measurement. In this work, it was confirmed that the polymer hydrophilicity after the O-2 plasma treatment was sharply increased due to the formation of the highly oxidized surface layer. It was shown that exposure in an ammonia plasma led to the formation of nitrogen-containing groups on the polymer surface. It was found that both Ar and NH3 plasma treatment of the preliminary oxidized polymer led to the moderate extension of the water contact angle due to the decrease of the oxygen-containing polar groups' concentrations on the parylene surface.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - Graduate School > Department of Control and Instrumentation Engineering > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.