Polarized thermal radiation by layer-by-layer metallic emitters with sub-wavelength grating
DC Field | Value | Language |
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dc.contributor.author | Lee, Jae-Hwang | - |
dc.contributor.author | Leung, Wai | - |
dc.contributor.author | Kim, Tae Guen | - |
dc.contributor.author | Constant, Kristen | - |
dc.contributor.author | Ho, Kai-Ming | - |
dc.date.accessioned | 2021-09-09T07:37:39Z | - |
dc.date.available | 2021-09-09T07:37:39Z | - |
dc.date.issued | 2008-06-09 | - |
dc.identifier.issn | 1094-4087 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/123388 | - |
dc.description.abstract | Metallic thermal emitters consisting of two layers of differently structured nickel gratings on a homogeneous nickel layer are fabricated by soft lithography and studied for polarized thermal radiation. A thermal emitter in combination with a sub-wavelength grating shows a high extinction ratio, with a maximum value close to 5, in a wide mid-infrared range from 3.2 to 7.8 mu m, as well as high emissivity up to 0.65 at a wavelength of 3.7 mu m. All measurements show good agreement with theoretical predictions. Numerical simulations reveal that a high electric field exists within the localized air space surrounded by the gratings and the intensified electric-field is only observed for the polarizations perpendicular to the top sub-wavelength grating. This result suggests how the emissivity of a metal can be selectively enhanced at a certain range of wavelengths for a given polarization. (c) 2008 Optical Society of America. | - |
dc.format.extent | 6 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | OPTICAL SOC AMER | - |
dc.title | Polarized thermal radiation by layer-by-layer metallic emitters with sub-wavelength grating | - |
dc.type | Article | - |
dc.publisher.location | 미국 | - |
dc.identifier.doi | 10.1364/OE.16.008742 | - |
dc.identifier.scopusid | 2-s2.0-45249092718 | - |
dc.identifier.wosid | 000256859900042 | - |
dc.identifier.bibliographicCitation | OPTICS EXPRESS, v.16, no.12, pp 8742 - 8747 | - |
dc.citation.title | OPTICS EXPRESS | - |
dc.citation.volume | 16 | - |
dc.citation.number | 12 | - |
dc.citation.startPage | 8742 | - |
dc.citation.endPage | 8747 | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Optics | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.subject.keywordPlus | DOPED SILICON | - |
dc.subject.keywordPlus | EMISSION | - |
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