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High-Performance Flexible InAs Thin-Film Photodetector Arrays with Heteroepitaxial Growth Using an Abruptly Graded InxAl1-xAs Buffer

Authors
Woo, SeungwanRyu, GeunhwanKang, Soo SeokKim, Tae SooHong, NamgiHan, Jae-HoonChu, Rafael JumarLee, In-HwanJung, DaehwanChoi, Won Jun
Issue Date
24-Nov-2021
Publisher
AMER CHEMICAL SOC
Keywords
photodetector; heteroepitaxial growth; metal wafer bonding; epitaxial lift-off; mid-infrared; molecular beam epitaxy
Citation
ACS APPLIED MATERIALS & INTERFACES, v.13, no.46, pp.55648 - 55655
Indexed
SCIE
SCOPUS
Journal Title
ACS APPLIED MATERIALS & INTERFACES
Volume
13
Number
46
Start Page
55648
End Page
55655
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/137638
DOI
10.1021/acsami.1c14687
ISSN
1944-8244
Abstract
Current infrared thermal image sensors are mainly based on planar firm substrates, but the rigid form factor appears to restrain the versatility of their applications. For wearable health monitoring and implanted biomedical sensing, transfer of active device layers onto a flexible substrate is required while controlling the high-quality crystalline interface. Here, we demonstrate high-detectivity flexible InAs thin-film mid-infrared photodetector arrays through high-yield wafer bonding and a heteroepitaxial lift-off process. An abruptly graded InxAl1-xAs (0.5 < x < 1) buffer was found to drastically improve the lift-off interface morphology and reduce the threading dislocation density twice, compared to the conventional linear grading method. Also, our flexible InAs photodetectors showed excellent optical performance with high mechanical robustness, a peak room-temperature specific detectivity of 1.21 x 10(9) cm-Hz(1/2)/W at 3.4 mu m, and excellent device reliability. This flexible InAs photodetector enabled by the heteroepitaxial lift-off method shows promise for next-generation thermal image sensors.
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