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Tin dioxide sensing layer grown on tubular nanostructures by a non-aqueous atomic layer deposition process
- Authors
- 유승호
- Issue Date
- 2월-2011
- Publisher
- WILEY
- Citation
- ADVANCED FUNCTIONAL MATERIALS, v.21, no.4, pp.658 - 666
- Indexed
- SCIE
SCOPUS
- Journal Title
- ADVANCED FUNCTIONAL MATERIALS
- Volume
- 21
- Number
- 4
- Start Page
- 658
- End Page
- 666
- ISSN
- 1616301X
- Abstract
- A new atomic layer deposition (ALD) process for nanocrystalline tin dioxide films is developed and applied for the coating of nanostructured materials. This approach, which is adapted from non-hydrolytic sol-gel chemistry, permits the deposition of SnO
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