Improved remnant polarization of Zr-doped HfO2 ferroelectric film by CF4/O-2 plasma passivation
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Yejoo | - |
dc.contributor.author | Park, Hyeonjung | - |
dc.contributor.author | Han, Changwoo | - |
dc.contributor.author | Min, Jinhong | - |
dc.contributor.author | Shin, Changhwan | - |
dc.date.accessioned | 2022-11-15T13:41:05Z | - |
dc.date.available | 2022-11-15T13:41:05Z | - |
dc.date.created | 2022-11-15 | - |
dc.date.issued | 2022-10-06 | - |
dc.identifier.issn | 2045-2322 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/145483 | - |
dc.description.abstract | In this work, the impact of fluorine (CF4) and oxygen (O-2) plasma passivation on HfZrOx (HZO) based ferroelectric capacitor was investigated. By the fluorine passivation, the surface trap density and oxygen vacancies in the HZO-based Metal-ferroelectric-insulator-semiconductor (MFIS) capacitors were suppressed, resulting in the increased pristine remnant polarization (2P(r)). The pristine value (2P(r)) of baseline samples annealed at 500 degrees C and 600 degrees C were 11.4 mu C/cm(2) and 24.4 mu C/cm(2), respectively. However, with the F-passivation, the 2P(r) values were increased to 30.8 mu C/cm(2) and 48.2 mu C/cm(2) for 500 degrees C and 600 degrees C, respectively. The amount of surface defects and oxygen vacancies are quantitatively confirmed by the conductance method and XPS analysis. However, due to the incorporation of fluorine atoms into the ferroelectric-insulator films, undesirable degradation on endurance characteristics were observed. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | NATURE PORTFOLIO | - |
dc.title | Improved remnant polarization of Zr-doped HfO2 ferroelectric film by CF4/O-2 plasma passivation | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Shin, Changhwan | - |
dc.identifier.doi | 10.1038/s41598-022-21263-8 | - |
dc.identifier.scopusid | 2-s2.0-85139290332 | - |
dc.identifier.wosid | 000864845400069 | - |
dc.identifier.bibliographicCitation | SCIENTIFIC REPORTS, v.12, no.1 | - |
dc.relation.isPartOf | SCIENTIFIC REPORTS | - |
dc.citation.title | SCIENTIFIC REPORTS | - |
dc.citation.volume | 12 | - |
dc.citation.number | 1 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | Y | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.