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Nondestructive Photopatterning of Heavy-Metal-Free Quantum Dots

Authors
Yang, JeehyeLee, MyeongjaePark, Se YoungPark, MyoungjinKim, JonghoonSitapure, NiranjanHahm, DonghyoRhee, SeunghyunLee, DaeyeonJo, HyunwooJo, Yong HyunLim, JaeminKim, JungwookShin, Tae JooLee, Doh C.Kwak, KyungwonKwon, Joseph S.Kim, BongSooBae, Wan KiKang, Moon Sung
Issue Date
10월-2022
Publisher
WILEY-V C H VERLAG GMBH
Keywords
heavy-metal-free quantum dots; high-resolution patterning; ligand crosslinking; photopatterning
Citation
ADVANCED MATERIALS, v.34, no.43
Indexed
SCIE
SCOPUS
Journal Title
ADVANCED MATERIALS
Volume
34
Number
43
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/145711
DOI
10.1002/adma.202205504
ISSN
0935-9648
Abstract
Electroluminescence from quantum dots (QDs) is a suitable photon source for futuristic displays offering hyper-realistic images with free-form factors. Accordingly, a nondestructive and scalable process capable of rendering multicolored QD patterns on a scale of several micrometers needs to be established. Here, nondestructive direct photopatterning for heavy-metal-free QDs is reported using branched light-driven ligand crosslinkers (LiXers) containing multiple azide units. The branched LiXers effectively interlock QD films via photo-crosslinking native aliphatic QD surface ligands without compromising the intrinsic optoelectronic properties of QDs. Using branched LiXers with six sterically engineered azide units, RGB QD patterns are achieved on the micrometer scale. The photo-crosslinking process does not affect the photoluminescence and electroluminescence characteristics of QDs and extends the device lifetime. This nondestructive method can be readily adapted to industrial processes and make an immediate impact on display technologies, as it uses widely available photolithography facilities and high-quality heavy-metal-free QDs with aliphatic ligands.
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