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Gate-tunable silicon oxide memory based on vertically integrated graphene barristorGate-tunable silicon oxide memory based on vertically integrated graphene barristor

Alternative Title
Gate-tunable silicon oxide memory based on vertically integrated graphene barristor
Authors
Gunuk Wang
Issue Date
7-12월-2017
Publisher
Applied Physics Division, The Korean Physical Society
Citation
The 10th International Conference on Advanced Materials and Devices (2017)
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/20728
Conference Name
The 10th International Conference on Advanced Materials and Devices (2017)
Place
KO
Conference Date
2017-12-05
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Graduate School > KU-KIST Graduate School of Converging Science and Technology > 2. Conference Papers

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