Surface analysis of N2 plasma treated sapphire substrate for AlN buffer layer
DC Field | Value | Language |
---|---|---|
dc.contributor.author | BYUN, Dong Jin | - |
dc.date.accessioned | 2021-08-28T05:48:08Z | - |
dc.date.available | 2021-08-28T05:48:08Z | - |
dc.date.created | 2021-04-22 | - |
dc.date.issued | 2017-08-25 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/22823 | - |
dc.publisher | The Materials Science Society of Japan | - |
dc.title | Surface analysis of N2 plasma treated sapphire substrate for AlN buffer layer | - |
dc.title.alternative | Surface analysis of N2 plasma treated sapphire substrate for AlN buffer layer | - |
dc.type | Conference | - |
dc.contributor.affiliatedAuthor | BYUN, Dong Jin | - |
dc.identifier.bibliographicCitation | Japan-Korea Materials Science Technology 2017 | - |
dc.relation.isPartOf | Japan-Korea Materials Science Technology 2017 | - |
dc.relation.isPartOf | The 4th japan-Korea International Symposium on Materials Science and Technology | - |
dc.citation.title | Japan-Korea Materials Science Technology 2017 | - |
dc.citation.conferencePlace | JA | - |
dc.citation.conferencePlace | Osaka, Kindai University | - |
dc.citation.conferenceDate | 2017-08-24 | - |
dc.type.rims | CONF | - |
dc.description.journalClass | 1 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.