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Characteristics of Sputtered AlN Buffer Layer as Function of N2 Partial Pressure on Patterned Sapphire Substrate

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dc.contributor.authorBYUN, Dong Jin-
dc.date.accessioned2021-08-28T11:34:13Z-
dc.date.available2021-08-28T11:34:13Z-
dc.date.created2021-04-22-
dc.date.issued2016-11-17-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/26194-
dc.publisher한국재료학회-
dc.titleCharacteristics of Sputtered AlN Buffer Layer as Function of N2 Partial Pressure on Patterned Sapphire Substrate-
dc.title.alternativeCharacteristics of Sputtered AlN Buffer Layer as Function of N2 Partial Pressure on Patterned Sapphire Substrate-
dc.typeConference-
dc.contributor.affiliatedAuthorBYUN, Dong Jin-
dc.identifier.bibliographicCitation2016년도 한국재료학회 추계학술대회 및 한-일 재료공학 심포지엄-
dc.relation.isPartOf2016년도 한국재료학회 추계학술대회 및 한-일 재료공학 심포지엄-
dc.relation.isPartOf2016년도 한국재료학회 추계학술대회 및 한-일 재료공학 심포지엄-
dc.citation.title2016년도 한국재료학회 추계학술대회 및 한-일 재료공학 심포지엄-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2016-11-15-
dc.type.rimsCONF-
dc.description.journalClass2-
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공과대학 (신소재공학부)
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