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Nonvolatile Memory device using mobile protons via insertion hydrogen neutral beam treatment process at room temperature.

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-28T13:48:41Z-
dc.date.available2021-08-28T13:48:41Z-
dc.date.created2021-04-22-
dc.date.issued2016-09-26-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/27573-
dc.publisherMaterials Research Society of Korea-
dc.titleNonvolatile Memory device using mobile protons via insertion hydrogen neutral beam treatment process at room temperature.-
dc.title.alternativeNonvolatile Memory device using mobile protons via insertion hydrogen neutral beam treatment process at room temperature.-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitationICMAP2016(The 6th International Conference on Microelectronics and Plasma Technology)-
dc.relation.isPartOfICMAP2016(The 6th International Conference on Microelectronics and Plasma Technology)-
dc.relation.isPartOfICMAP2016(The 6th International Conference on Microelectronics and Plasma Technology)-
dc.citation.titleICMAP2016(The 6th International Conference on Microelectronics and Plasma Technology)-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2016-09-26-
dc.type.rimsCONF-
dc.description.journalClass1-
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