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Non volatile memory TFT using mobile proton in gate dielectric by hydrogen neutral beam treatment

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-28T18:34:00Z-
dc.date.available2021-08-28T18:34:00Z-
dc.date.created2021-04-22-
dc.date.issued2016-02-19-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/30370-
dc.publisher(사)한국진공학회(KVS)-
dc.titleNon volatile memory TFT using mobile proton in gate dielectric by hydrogen neutral beam treatment-
dc.title.alternativeNon volatile memory TFT using mobile proton in gate dielectric by hydrogen neutral beam treatment-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitation제50회 한국진공학회 동계정기학술대회-
dc.relation.isPartOf제50회 한국진공학회 동계정기학술대회-
dc.relation.isPartOf제50회 한국진공학회 동계정기학술대회-
dc.citation.title제50회 한국진공학회 동계정기학술대회-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2016-02-17-
dc.type.rimsCONF-
dc.description.journalClass2-
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