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Quantitative Profiling of Temperature and Spreading Thermal Resistance around a 70 nm Wide Nano-Heater Patterned on SOI Wafer Using NP SThM

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dc.contributor.authorKWON, Oh Myoung-
dc.date.accessioned2021-08-29T02:53:41Z-
dc.date.available2021-08-29T02:53:41Z-
dc.date.created2021-04-22-
dc.date.issued2015-04-10-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/35534-
dc.publisherMATERIALS RESEARCH SOCIETY-
dc.titleQuantitative Profiling of Temperature and Spreading Thermal Resistance around a 70 nm Wide Nano-Heater Patterned on SOI Wafer Using NP SThM-
dc.title.alternativeQuantitative Profiling of Temperature and Spreading Thermal Resistance around a 70 nm Wide Nano-Heater Patterned on SOI Wafer Using NP SThM-
dc.typeConference-
dc.contributor.affiliatedAuthorKWON, Oh Myoung-
dc.identifier.bibliographicCitation2015 MRS SPRING MEETING & EXHIBIT-
dc.relation.isPartOf2015 MRS SPRING MEETING & EXHIBIT-
dc.relation.isPartOf2015 MRS SPRING MEETING & EXHIBIT PROGRAM & EXHIBIT GUIDE-
dc.citation.title2015 MRS SPRING MEETING & EXHIBIT-
dc.citation.conferencePlaceUS-
dc.citation.conferenceDate2015-04-06-
dc.type.rimsCONF-
dc.description.journalClass1-
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