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Effect of negative oxygen ion bombardment on gate bias stability of InGaZnO thin film transistors

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T03:46:42Z-
dc.date.available2021-08-29T03:46:42Z-
dc.date.created2021-04-22-
dc.date.issued2015-02-11-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/35950-
dc.publisher(사)한국진공학회(KVS)-
dc.titleEffect of negative oxygen ion bombardment on gate bias stability of InGaZnO thin film transistors-
dc.title.alternativeEffect of negative oxygen ion bombardment on gate bias stability of InGaZnO thin film transistors-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitation제48회 한국진공학회 동계정기학술대회-
dc.relation.isPartOf제48회 한국진공학회 동계정기학술대회-
dc.relation.isPartOf제48회 한국진공학회 동계정기학술대회-
dc.citation.title제48회 한국진공학회 동계정기학술대회-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2015-02-09-
dc.type.rimsCONF-
dc.description.journalClass2-
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