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The Effects of Oxygen Pessure on a-IGZO TFT during Sputtering Process

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T09:48:33Z-
dc.date.available2021-08-29T09:48:33Z-
dc.date.created2021-04-22-
dc.date.issued2014-07-09-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/39516-
dc.publisherKVS(The Korean Vaccuum Society)-
dc.titleThe Effects of Oxygen Pessure on a-IGZO TFT during Sputtering Process-
dc.title.alternativeThe Effects of Oxygen Pessure on a-IGZO TFT during Sputtering Process-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitationICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.relation.isPartOfICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.relation.isPartOfICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.citation.titleICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2014-07-08-
dc.type.rimsCONF-
dc.description.journalClass1-
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