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Effect of The Bombardment of Accelerated Negative Oxygen lons on a-IGZO Thin Films by Superimposed rf/dc Magnetron Sputtering

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T09:48:47Z-
dc.date.available2021-08-29T09:48:47Z-
dc.date.created2021-04-22-
dc.date.issued2014-07-09-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/39520-
dc.publisherKVS(The Korean Vaccuum Society)-
dc.titleEffect of The Bombardment of Accelerated Negative Oxygen lons on a-IGZO Thin Films by Superimposed rf/dc Magnetron Sputtering-
dc.title.alternativeEffect of The Bombardment of Accelerated Negative Oxygen lons on a-IGZO Thin Films by Superimposed rf/dc Magnetron Sputtering-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitationICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.relation.isPartOfICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.relation.isPartOfICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.citation.titleICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2014-07-08-
dc.type.rimsCONF-
dc.description.journalClass1-
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