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Nonvolatile Memory device using mobile protons via insertion hydrogen neutral beam treatment process between SiO2 deposition processes at room temperatureNonvolatile Memory device using mobile protons via insertion hydrogen neutral beam treatment process between SiO2 deposition processes at room temperature

Alternative Title
Nonvolatile Memory device using mobile protons via insertion hydrogen neutral beam treatment process between SiO2 deposition processes at room temperature
Authors
Hong MunPyo
Issue Date
9-7월-2014
Publisher
KVS(The Korean Vaccuum Society)
Citation
ICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/39521
Conference Name
ICMAP 2014 - International Confernce on Microelectronics and Plasma Technology 2014
Place
KO
Conference Date
2014-07-08
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Graduate School > Department of Applied Physics > 2. Conference Papers

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