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Introduction of SiO2 mask layer for Selective Area Growth of GaN Introduction of SiO2 mask layer for Selective Area Growth of GaN on Patterned Sapphire Substrate

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dc.contributor.authorBYUN, Dong Jin-
dc.date.accessioned2021-08-29T11:39:08Z-
dc.date.available2021-08-29T11:39:08Z-
dc.date.created2021-04-22-
dc.date.issued2014-05-15-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/40607-
dc.publisher한국재료학회-
dc.titleIntroduction of SiO2 mask layer for Selective Area Growth of GaN Introduction of SiO2 mask layer for Selective Area Growth of GaN on Patterned Sapphire Substrate-
dc.title.alternativeIntroduction of SiO2 mask layer for Selective Area Growth of GaN on Patterned Sapphire Substrate-
dc.typeConference-
dc.contributor.affiliatedAuthorBYUN, Dong Jin-
dc.identifier.bibliographicCitation2014년도 한국재료학회 춘계학술발표대회 및 제 26회 신소재 심포지엄-
dc.relation.isPartOf2014년도 한국재료학회 춘계학술발표대회 및 제 26회 신소재 심포지엄-
dc.relation.isPartOf2014년도 한국재료학회 춘계학술발표대회 및 제 26회 신소재 심포지엄-
dc.citation.title2014년도 한국재료학회 춘계학술발표대회 및 제 26회 신소재 심포지엄-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2014-05-15-
dc.type.rimsCONF-
dc.description.journalClass2-
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공과대학 (신소재공학부)
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