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Introduction of SiO2 mask layer for Selective Area Growth of GaN Introduction of SiO2 mask layer for Selective Area Growth of GaN on Patterned Sapphire SubstrateIntroduction of SiO2 mask layer for Selective Area Growth of GaN on Patterned Sapphire Substrate

Alternative Title
Introduction of SiO2 mask layer for Selective Area Growth of GaN on Patterned Sapphire Substrate
Authors
BYUN, Dong Jin
Issue Date
15-5월-2014
Publisher
한국재료학회
Citation
2014년도 한국재료학회 춘계학술발표대회 및 제 26회 신소재 심포지엄
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/40607
Conference Name
2014년도 한국재료학회 춘계학술발표대회 및 제 26회 신소재 심포지엄
Place
KO
Conference Date
2014-05-15
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College of Engineering > Department of Materials Science and Engineering > 2. Conference Papers

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공과대학 (신소재공학부)
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