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Controlling of oxygen impurity and crystal fraction in nano-crytal silicon thin film processed with low hydrogen dilution gas system at near room temperature by using neutral beam assisted CVD
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-29T13:55:29Z | - |
| dc.date.available | 2021-08-29T13:55:29Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2014-01-23 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/42066 | - |
| dc.publisher | ITC 2014 – 10th International Thin-Film Transistor Conference | - |
| dc.title | Controlling of oxygen impurity and crystal fraction in nano-crytal silicon thin film processed with low hydrogen dilution gas system at near room temperature by using neutral beam assisted CVD | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | ITC 2014 – 10th International Thin-Film Transistor Conference | - |
| dc.relation.isPartOf | ITC 2014 – 10th International Thin-Film Transistor Conference | - |
| dc.relation.isPartOf | ITC 2014 – 10th International Thin-Film Transistor Conference | - |
| dc.citation.title | ITC 2014 – 10th International Thin-Film Transistor Conference | - |
| dc.citation.conferencePlace | NE | - |
| dc.citation.conferenceDate | 2014-01-23 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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