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Influence of Nano-Crystal Silicon Thin Film and Thin Film Transistor Under Neutral Beam Assisted Hydrogen Plasma Treatment

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T16:33:54Z-
dc.date.available2021-08-29T16:33:54Z-
dc.date.created2021-04-22-
dc.date.issued2013-08-28-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/43613-
dc.publisherCeSTA (Center for Surface Technology and Applications)-
dc.titleInfluence of Nano-Crystal Silicon Thin Film and Thin Film Transistor Under Neutral Beam Assisted Hydrogen Plasma Treatment-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitationAEPSE 2013 (9th Asian-European International Conference On Plasma Surface Engineering)-
dc.relation.isPartOfAEPSE 2013 (9th Asian-European International Conference On Plasma Surface Engineering)-
dc.relation.isPartOfAEPSE 2013 (9th Asian-European International Conference On Plasma Surface Engineering)-
dc.citation.titleAEPSE 2013 (9th Asian-European International Conference On Plasma Surface Engineering)-
dc.citation.conferencePlaceKO-
dc.citation.conferenceDate2013-08-25-
dc.type.rimsCONF-
dc.description.journalClass1-
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