Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | BYUN, Dong Jin | - |
| dc.date.accessioned | 2021-08-29T16:54:29Z | - |
| dc.date.available | 2021-08-29T16:54:29Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2013-07-02 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/43928 | - |
| dc.publisher | 한국물리학회 | - |
| dc.title | The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2 | - |
| dc.title.alternative | The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2 | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | BYUN, Dong Jin | - |
| dc.identifier.bibliographicCitation | The 16th International Symposium on the Physics of Semiconductors and Applications | - |
| dc.relation.isPartOf | The 16th International Symposium on the Physics of Semiconductors and Applications | - |
| dc.relation.isPartOf | The 16th International Symposium on the Physics of Semiconductors and Applications | - |
| dc.citation.title | The 16th International Symposium on the Physics of Semiconductors and Applications | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferenceDate | 2013-07-02 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.