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The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
- Alternative Title
- The effect of mixed gas (Ar+H2) plasma pretreatment of copper CVD using Cu(dmamb)2
- Authors
- BYUN, Dong Jin
- Issue Date
- 2-7월-2013
- Publisher
- 한국물리학회
- Citation
- The 16th International Symposium on the Physics of Semiconductors and Applications
- Conference Name
- The 16th International Symposium on the Physics of Semiconductors and Applications
- Place
- KO
- Conference Date
- 2013-07-02
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