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Fine Tuning of Termination Capacitance and Neutral Beam Energy Dependent Controlling of Oxygen Contents in Undoped Nano-Crytral Silicon Thin Film by using Neutral Beam Assisted ICP CVD
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-29T18:46:10Z | - |
| dc.date.available | 2021-08-29T18:46:10Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2013-02-06 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/44924 | - |
| dc.publisher | 동부하이텍, 한국반도체산업협회, 한국반도체연구조합 | - |
| dc.title | Fine Tuning of Termination Capacitance and Neutral Beam Energy Dependent Controlling of Oxygen Contents in Undoped Nano-Crytral Silicon Thin Film by using Neutral Beam Assisted ICP CVD | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | 제20회 한국반도체학술대회 | - |
| dc.relation.isPartOf | 제20회 한국반도체학술대회 | - |
| dc.relation.isPartOf | 제20회 한국반도체학술대회 | - |
| dc.citation.title | 제20회 한국반도체학술대회 | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferencePlace | 웰리힐리파크 | - |
| dc.citation.conferenceDate | 2013-02-04 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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