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Beyond the Current Horizontal of Silicon Thin Film Technology: Light-Soaking Free Nano-Crystal Embedded Polymorphous Silicon Thin Film and TFT by Neutral Beam Assisted CVD at Room Temperature
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-29T19:44:45Z | - |
| dc.date.available | 2021-08-29T19:44:45Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2012-10-09 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/45488 | - |
| dc.publisher | the Eletrochemical Society of Japan | - |
| dc.title | Beyond the Current Horizontal of Silicon Thin Film Technology: Light-Soaking Free Nano-Crystal Embedded Polymorphous Silicon Thin Film and TFT by Neutral Beam Assisted CVD at Room Temperature | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | PRiME 2012 | - |
| dc.relation.isPartOf | PRiME 2012 | - |
| dc.relation.isPartOf | PRiME 2012 | - |
| dc.citation.title | PRiME 2012 | - |
| dc.citation.conferencePlace | US | - |
| dc.citation.conferencePlace | 327,Level3, Hawaii Convention Center | - |
| dc.citation.conferenceDate | 2012-10-07 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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