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Influence of Nitrogen Plasma Treatment on Low Temperature Deposited Silicon Nitride Thin Films for Flesible Display
- Authors
- Hong MunPyo
- Issue Date
- 7-7월-2012
- Publisher
- ICMAP 2012 (The 4th International Conference on Microelectronics and Plasma Technology)
- Citation
- ICMAP 2012 (The 4th International Conference on Microelectronics and Plasma Technology)
- Conference Name
- ICMAP 2012 (The 4th International Conference on Microelectronics and Plasma Technology)
- Place
- KO
Ramada Plaza Jeju Hotel, Jeju, Korea
- Conference Date
- 2012-07-04
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Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
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