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Development of Light Induced Degradation Free Nano Crystal Embedded Amorphous Silicon Thin Film by Neutral Beam Assisted CVD Process at Room Temperature

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dc.contributor.authorHong MunPyo-
dc.date.accessioned2021-08-29T20:47:19Z-
dc.date.available2021-08-29T20:47:19Z-
dc.date.created2021-04-22-
dc.date.issued2012-02-16-
dc.identifier.urihttps://scholar.korea.ac.kr/handle/2021.sw.korea/46143-
dc.publisher한국반도체학술대회-
dc.titleDevelopment of Light Induced Degradation Free Nano Crystal Embedded Amorphous Silicon Thin Film by Neutral Beam Assisted CVD Process at Room Temperature-
dc.typeConference-
dc.contributor.affiliatedAuthorHong MunPyo-
dc.identifier.bibliographicCitation제19회 한국반도체학술대회-
dc.relation.isPartOf제19회 한국반도체학술대회-
dc.relation.isPartOf제19회 한국반도체학술대회-
dc.citation.title제19회 한국반도체학술대회-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlace고려대학교 자연캠퍼스-
dc.citation.conferenceDate2012-02-15-
dc.type.rimsCONF-
dc.description.journalClass2-
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