Development of Light Induced Degradation Free Nano Crystal Embedded Amorphous Silicon Thin Film by Neutral Beam Assisted CVD Process at Room Temperature
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hong MunPyo | - |
dc.date.accessioned | 2021-08-29T20:47:19Z | - |
dc.date.available | 2021-08-29T20:47:19Z | - |
dc.date.created | 2021-04-22 | - |
dc.date.issued | 2012-02-16 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/46143 | - |
dc.publisher | 한국반도체학술대회 | - |
dc.title | Development of Light Induced Degradation Free Nano Crystal Embedded Amorphous Silicon Thin Film by Neutral Beam Assisted CVD Process at Room Temperature | - |
dc.type | Conference | - |
dc.contributor.affiliatedAuthor | Hong MunPyo | - |
dc.identifier.bibliographicCitation | 제19회 한국반도체학술대회 | - |
dc.relation.isPartOf | 제19회 한국반도체학술대회 | - |
dc.relation.isPartOf | 제19회 한국반도체학술대회 | - |
dc.citation.title | 제19회 한국반도체학술대회 | - |
dc.citation.conferencePlace | KO | - |
dc.citation.conferencePlace | 고려대학교 자연캠퍼스 | - |
dc.citation.conferenceDate | 2012-02-15 | - |
dc.type.rims | CONF | - |
dc.description.journalClass | 2 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
(02841) 서울특별시 성북구 안암로 14502-3290-1114
COPYRIGHT © 2021 Korea University. All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.