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Effect of plasma treatment in Cu CVD thin film growth using the Cu(dmamb)2
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | BYUN, Dong Jin | - |
| dc.date.accessioned | 2021-08-29T22:33:02Z | - |
| dc.date.available | 2021-08-29T22:33:02Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2010-08-24 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/47164 | - |
| dc.publisher | MRS KOREA | - |
| dc.title | Effect of plasma treatment in Cu CVD thin film growth using the Cu(dmamb)2 | - |
| dc.title.alternative | Effect of plasma treatment in Cu CVD thin film growth using the Cu(dmamb)2 | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | BYUN, Dong Jin | - |
| dc.identifier.bibliographicCitation | International Conference on Electronic Materials 2010 presented by International Union of Material Research Societies | - |
| dc.relation.isPartOf | International Conference on Electronic Materials 2010 presented by International Union of Material Research Societies | - |
| dc.relation.isPartOf | International Conference on Electronic Materials 2010 presented by International Union of Material Research Societies | - |
| dc.citation.title | International Conference on Electronic Materials 2010 presented by International Union of Material Research Societies | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferenceDate | 2010-08-22 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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