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Novel deposition technology for nano-crystalline silicon thin film with various optical band gap at low temperature by reactive particle beam assisted CVD system
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-29T23:52:14Z | - |
| dc.date.available | 2021-08-29T23:52:14Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2009-11-10 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/48046 | - |
| dc.publisher | The Materials Research Society of Korea | - |
| dc.subject | Nano Cystalline silicon, Low temperature, CVD | - |
| dc.title | Novel deposition technology for nano-crystalline silicon thin film with various optical band gap at low temperature by reactive particle beam assisted CVD system | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | 19th International Photovoltaic Science and Engineering Conference & Exhibition, pp.252 - 253 | - |
| dc.relation.isPartOf | 19th International Photovoltaic Science and Engineering Conference & Exhibition | - |
| dc.citation.title | 19th International Photovoltaic Science and Engineering Conference & Exhibition | - |
| dc.citation.startPage | 252 | - |
| dc.citation.endPage | 253 | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferencePlace | ICC Jeju, Korea | - |
| dc.citation.conferenceDate | 2009-11-09 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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