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The structual and electrical properties of nanocrystalline Si thin films depostied by reactive particle beam assisted chemical vapor deposition process

Authors
Hong MunPyo
Keywords
Nano Cystalline silicon, CVD
Issue Date
24-9월-2009
Publisher
The Korean Vacuum Society
Citation
2nd International Conference on Microelectronics and Plasma Technology, pp.204
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/48959
Conference Name
2nd International Conference on Microelectronics and Plasma Technology
Place
KO
BEXCO, Busan, Korea
Conference Date
2009-09-23
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