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Etching characteristics and application of reactive particle beam assisted sputtering process for amorphous carbon hard mask
- Authors
- Hong MunPyo
- Keywords
- Etching, Carbon Hard Mask, Sputter
- Issue Date
- 24-9월-2009
- Publisher
- The Korean Vacuum Society
- Citation
- 2nd International Conference on Microelectronics and Plasma Technology, pp.86
- Conference Name
- 2nd International Conference on Microelectronics and Plasma Technology
- Place
- BEXCO, Busan, Korea
- Conference Date
- 2009-09-23
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Collections - Graduate School > Department of Applied Physics > 2. Conference Papers
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