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Reactive Particle Beam Based Deposition Process of Nano-Crystalline Silicon Thin Film for Next Generation AM-OLED TFT backplane
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-30T01:33:37Z | - |
| dc.date.available | 2021-08-30T01:33:37Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2009-09-23 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/48978 | - |
| dc.publisher | The Korean Vacuum Society | - |
| dc.subject | CVD, nc-Si TFT | - |
| dc.title | Reactive Particle Beam Based Deposition Process of Nano-Crystalline Silicon Thin Film for Next Generation AM-OLED TFT backplane | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | 2nd International Conference on Microelectronics and Plasma Technology, pp.418 | - |
| dc.relation.isPartOf | 2nd International Conference on Microelectronics and Plasma Technology | - |
| dc.relation.isPartOf | Proceedings of 2nd International Conference on Microelectronics and Plasma Technology | - |
| dc.citation.title | 2nd International Conference on Microelectronics and Plasma Technology | - |
| dc.citation.startPage | 418 | - |
| dc.citation.endPage | 418 | - |
| dc.citation.conferencePlace | KO | - |
| dc.citation.conferencePlace | BEXCO, Busan, Korea | - |
| dc.citation.conferenceDate | 2009-09-23 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 2 | - |
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