LER-Induced Random Variation-Immune Effect of Metal-Interlayer-Semiconductor Source/Drain Structure on N-Type Ge Junction less FinFETs
DC Field | Value | Language |
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dc.contributor.author | Jung, Seung-Geun | - |
dc.contributor.author | Park, Euyjin | - |
dc.contributor.author | Shin, Changhwan | - |
dc.contributor.author | Yu, Hyun-Yong | - |
dc.date.accessioned | 2021-08-30T02:53:04Z | - |
dc.date.available | 2021-08-30T02:53:04Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2021-03 | - |
dc.identifier.issn | 0018-9383 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/49509 | - |
dc.description.abstract | Herein, the line-edge roughness (LER)-induced random performance variation-immune effect of metal-interlayer-semiconductor (MIS) source/drain (S/D) in 7 nm n-type Ge (n-Ge) junctionless field-effect transistors (JLFETs) were investigated by 3-D TCAD simulations. Compared to the device without MIS S/D, the n-Ge JLFET with MIS S/D could effectively reduce the Ge fin doping concentration while maintaining the performance. It was demonstrated analytically that the reduced Ge fin doping concentration of the device with MIS S/D, compared to the device without MIS S/D, decreased the LER-induced random performance variations of the n-Ge JLFET; the standard deviations were reduced to similar to 0.0318 V for Vth (reduced by similar to 51.6%), 4.89 x 10(-6) A/mu m for I-on (reduced by similar to 92.1%), 1.44 x 10(-9) A/mu m for I-off (reduced by similar to 93.7%), 1.27 mV/dec for SS (reduced by similar to 23.1%), and similar to 5.40 mVN for drain-induced barrier lowering (DIBL) (reduced by similar to 30.8%). In addition, LER-induced random performance variation was investigated in terms of scaling down fin widths. The results provided critical insight into the variability reduction of the 7 nm n-Ge JLFETs. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.title | LER-Induced Random Variation-Immune Effect of Metal-Interlayer-Semiconductor Source/Drain Structure on N-Type Ge Junction less FinFETs | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Yu, Hyun-Yong | - |
dc.identifier.doi | 10.1109/TED.2021.3050031 | - |
dc.identifier.scopusid | 2-s2.0-85099732020 | - |
dc.identifier.wosid | 000622100700063 | - |
dc.identifier.bibliographicCitation | IEEE TRANSACTIONS ON ELECTRON DEVICES, v.68, no.3, pp.1340 - 1345 | - |
dc.relation.isPartOf | IEEE TRANSACTIONS ON ELECTRON DEVICES | - |
dc.citation.title | IEEE TRANSACTIONS ON ELECTRON DEVICES | - |
dc.citation.volume | 68 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 1340 | - |
dc.citation.endPage | 1345 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.subject.keywordAuthor | Ge | - |
dc.subject.keywordAuthor | interlayer (IL) | - |
dc.subject.keywordAuthor | junctionless field-effect transistor (JLFET) | - |
dc.subject.keywordAuthor | line-edge roughness (LERs) | - |
dc.subject.keywordAuthor | random performance variation | - |
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