Detailed Information

Cited 0 time in webofscience Cited 0 time in scopus
Metadata Downloads

Surface characteristics of sputtered Ta, Ti as barrier layer for copper deposition

Authors
BYUN, Dong Jin
Issue Date
7-11월-2008
Publisher
한국재료학회
Citation
2008년도 한국재료학회 추계학술발표대회 및 제 15회 신소재 심포지엄
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/53489
Conference Name
2008년도 한국재료학회 추계학술발표대회 및 제 15회 신소재 심포지엄
Place
KO
Conference Date
2008-11-07
Files in This Item
There are no files associated with this item.
Appears in
Collections
College of Engineering > Department of Materials Science and Engineering > 2. Conference Papers

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher BYUN, Dong Jin photo

BYUN, Dong Jin
공과대학 (신소재공학부)
Read more

Altmetrics

Total Views & Downloads

BROWSE