Effects of Surfactant Concentration on Step Height Reduction of SiO2 in Chemical Mechanical Polishing with Ceria Slurry
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lim, Dae-Soon | - |
dc.date.accessioned | 2021-08-31T02:18:39Z | - |
dc.date.available | 2021-08-31T02:18:39Z | - |
dc.date.created | 2021-04-22 | - |
dc.date.issued | 2008-07-30 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/56334 | - |
dc.publisher | The Hong Kong Polytechnic University | - |
dc.subject | CMP, SiO2, Ceria, Surfactant | - |
dc.title | Effects of Surfactant Concentration on Step Height Reduction of SiO2 in Chemical Mechanical Polishing with Ceria Slurry | - |
dc.type | Conference | - |
dc.contributor.affiliatedAuthor | Lim, Dae-Soon | - |
dc.identifier.bibliographicCitation | International Conference on Multifunctional Materials and Structures, pp.1494 - 1497 | - |
dc.relation.isPartOf | International Conference on Multifunctional Materials and Structures | - |
dc.citation.title | International Conference on Multifunctional Materials and Structures | - |
dc.citation.startPage | 1494 | - |
dc.citation.endPage | 1497 | - |
dc.citation.conferencePlace | HK | - |
dc.citation.conferencePlace | 홍콩(Polytechnic University | - |
dc.citation.conferenceDate | 2008-07-28 | - |
dc.type.rims | CONF | - |
dc.description.journalClass | 1 | - |
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