Atomic Layer Deposition of Ga2O3 Thin Films Using Dimethylgallium Isopropoxide and Water

Yunsoo Kim

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Atomic Layer Deposition of Ga2O3 Thin Films Using Dimethylgallium Isopropoxide and Water

Authors: Yunsoo Kim

Issue Date: 2-Jul-2008

URI: https://scholar.korea.ac.kr/handle/2021.sw.korea/56521

Place: 벨기에
Bruges (Oud Sint Jan)

Conference Date: 2008-06-29 ~ 2008-07-02

Conference Name: 8th International Conference on Atomic Layer Deposition (ALD 2008)

Files in This Item: There are no files associated with this item.

Appears in Collections: College of Science and Technology > Department of Advanced Materials Chemistry > 2. Conference Papers

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