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Etching Characteristics and Mechanism of VO2 in inductively coupled plasma
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Hong MunPyo | - |
| dc.date.accessioned | 2021-08-31T05:29:02Z | - |
| dc.date.available | 2021-08-31T05:29:02Z | - |
| dc.date.created | 2021-04-22 | - |
| dc.date.issued | 2008-06-24 | - |
| dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/56933 | - |
| dc.publisher | Center for Frontier Materials and Micro/Nano Science and Technology, NCKU | - |
| dc.subject | Etching characteristics, VO2 film | - |
| dc.title | Etching Characteristics and Mechanism of VO2 in inductively coupled plasma | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | Hong MunPyo | - |
| dc.identifier.bibliographicCitation | The 4th Asia Pacific Conference on Transducers and Micro/Nano Technology, pp.71 | - |
| dc.relation.isPartOf | The 4th Asia Pacific Conference on Transducers and Micro/Nano Technology | - |
| dc.relation.isPartOf | Proceeding on the 4th Asia Pacific Conference on Transducers and Micro/Nano Technology | - |
| dc.citation.title | The 4th Asia Pacific Conference on Transducers and Micro/Nano Technology | - |
| dc.citation.startPage | 71 | - |
| dc.citation.endPage | 71 | - |
| dc.citation.conferencePlace | CH | - |
| dc.citation.conferencePlace | tainan, Taiwan | - |
| dc.citation.conferenceDate | 2008-06-22 | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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