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Proton Irradiation of High Aluminum Content AlGaN Polarization Doped Field Effect Transistors

Authors
Carey, Patrick H.Ren, FanBae, JinhoKim, JihyunPearton, Stephen J.
Issue Date
10-2월-2020
Publisher
ELECTROCHEMICAL SOC INC
Citation
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, v.9, no.2
Indexed
SCIE
SCOPUS
Journal Title
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
Volume
9
Number
2
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/57675
DOI
10.1149/2162-8777/ab71f0
ISSN
2162-8769
Abstract
The effects of proton irradiation dose on the DC and switching properties of high aluminum content, polarization-doped field effect transistors (POLFETs) were studied. The POLFETs were irradiated at proton energy of 10 MeV at fluences of 1 x 10(14) cm(-2) and 3 x 10(14) cm(-2). The DC saturation current exhibited a 21 and 36% reduction at fluences of 1 x 10(14) cm(-2) and 3 x 10(14) cm(-2), respectively. The carrier removal rates for this energy was 677 cm(-1). However, switching current at 100 kHz demonstrated no change, with near ideal performance, as opposed to significant degradation in their GaN HEMT counterparts. This near ideal performance is attributed to the volume of the 3D electron gas in the POLFETs reducing the likelihood of negatively impacting scattering events, as opposed to the narrow 2D electron gas of the HEMT. The DC degradation and carrier removal rates are on par with reported traditional GaN HEMTs, but the switching performance is exceptionally improved. (C) 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.
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