Near-field sub-diffraction photolithography with an elastomeric photomask
DC Field | Value | Language |
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dc.contributor.author | Paik, Sangyoon | - |
dc.contributor.author | Kim, Gwangmook | - |
dc.contributor.author | Chang, Sehwan | - |
dc.contributor.author | Lee, Sooun | - |
dc.contributor.author | Jin, Dana | - |
dc.contributor.author | Jeong, Kwang-Yong | - |
dc.contributor.author | Lee, I. Sak | - |
dc.contributor.author | Lee, Jekwan | - |
dc.contributor.author | Moon, Hongjae | - |
dc.contributor.author | Lee, Jaejun | - |
dc.contributor.author | Chang, Kiseok | - |
dc.contributor.author | Choi, Su Seok | - |
dc.contributor.author | Moon, Jeongmin | - |
dc.contributor.author | Jung, Soonshin | - |
dc.contributor.author | Kang, Shinill | - |
dc.contributor.author | Lee, Wooyoung | - |
dc.contributor.author | Choi, Heon-Jin | - |
dc.contributor.author | Choi, Hyunyong | - |
dc.contributor.author | Kim, Hyun Jae | - |
dc.contributor.author | Lee, Jae-Hyun | - |
dc.contributor.author | Cheon, Jinwoo | - |
dc.contributor.author | Kim, Miso | - |
dc.contributor.author | Myoung, Jaemin | - |
dc.contributor.author | Park, Hong-Gyu | - |
dc.contributor.author | Shim, Wooyoung | - |
dc.date.accessioned | 2021-08-31T10:35:51Z | - |
dc.date.available | 2021-08-31T10:35:51Z | - |
dc.date.created | 2021-06-19 | - |
dc.date.issued | 2020-02-10 | - |
dc.identifier.issn | 2041-1723 | - |
dc.identifier.uri | https://scholar.korea.ac.kr/handle/2021.sw.korea/57679 | - |
dc.description.abstract | Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10(th) of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions. | - |
dc.language | English | - |
dc.language.iso | en | - |
dc.publisher | NATURE PUBLISHING GROUP | - |
dc.subject | FABRICATION | - |
dc.subject | COLOR | - |
dc.subject | NANOLITHOGRAPHY | - |
dc.subject | SILICON | - |
dc.subject | LIGHT | - |
dc.subject | FILMS | - |
dc.title | Near-field sub-diffraction photolithography with an elastomeric photomask | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Jeong, Kwang-Yong | - |
dc.contributor.affiliatedAuthor | Park, Hong-Gyu | - |
dc.identifier.doi | 10.1038/s41467-020-14439-1 | - |
dc.identifier.scopusid | 2-s2.0-85079223161 | - |
dc.identifier.wosid | 000514356400001 | - |
dc.identifier.bibliographicCitation | NATURE COMMUNICATIONS, v.11, no.1 | - |
dc.relation.isPartOf | NATURE COMMUNICATIONS | - |
dc.citation.title | NATURE COMMUNICATIONS | - |
dc.citation.volume | 11 | - |
dc.citation.number | 1 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | COLOR | - |
dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | LIGHT | - |
dc.subject.keywordPlus | FILMS | - |
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