Near-field sub-diffraction photolithography with an elastomeric photomask
- Authors
- Paik, Sangyoon; Kim, Gwangmook; Chang, Sehwan; Lee, Sooun; Jin, Dana; Jeong, Kwang-Yong; Lee, I. Sak; Lee, Jekwan; Moon, Hongjae; Lee, Jaejun; Chang, Kiseok; Choi, Su Seok; Moon, Jeongmin; Jung, Soonshin; Kang, Shinill; Lee, Wooyoung; Choi, Heon-Jin; Choi, Hyunyong; Kim, Hyun Jae; Lee, Jae-Hyun; Cheon, Jinwoo; Kim, Miso; Myoung, Jaemin; Park, Hong-Gyu; Shim, Wooyoung
- Issue Date
- 10-2월-2020
- Publisher
- NATURE PUBLISHING GROUP
- Citation
- NATURE COMMUNICATIONS, v.11, no.1
- Indexed
- SCIE
SCOPUS
- Journal Title
- NATURE COMMUNICATIONS
- Volume
- 11
- Number
- 1
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/57679
- DOI
- 10.1038/s41467-020-14439-1
- ISSN
- 2041-1723
- Abstract
- Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10(th) of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.
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Collections - College of Science > Department of Physics > 1. Journal Articles
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