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Epitaxial KNbO3:Yb3+,Er3+ nanopattern for enhanced upconversion photoluminescence

Authors
Park, HeeyeonLee, Kyu-TaeKwon, Soon-HongAhn, In HwanKim, ByunghoonKo, Doo-HyunKim, Woong
Issue Date
15-1월-2020
Publisher
ELSEVIER SCIENCE SA
Keywords
Upconversion; Sol-gel; Epitaxy; Nanopattern; Nanoimprint
Citation
JOURNAL OF ALLOYS AND COMPOUNDS, v.813
Indexed
SCIE
SCOPUS
Journal Title
JOURNAL OF ALLOYS AND COMPOUNDS
Volume
813
URI
https://scholar.korea.ac.kr/handle/2021.sw.korea/58292
DOI
10.1016/j.jallcom.2019.152238
ISSN
0925-8388
Abstract
Nanopatterned epitaxial films of upconversion (UC) materials are desirable for various applications such as display lighting, waveguides, and optical imaging. In this study, we demonstrate that a nanopatterned epitaxial film of a UC material can be fabricated by combining a sol-gel process and nanoimprint lithography. An epitaxial KNbO3:Yb3+,Er3+ film is grown on a lattice-matched SrTiO3 single-crystal substrate, which exhibits an approximately 70 times enhanced UC photoluminescence (PL) intensity compared to that of a non-epitaxial KNbO3:Yb3+,Er3+ film grown on a Si substrate. Moreover, the introduction of a nanopattern enhances the UCPL intensity similar to 20 times compared to that of a planar film with the same volume of material. Our study paves the way for a better fundamental understanding and expansion in the application of UC materials. (C) 2019 Elsevier B.V. All rights reserved.
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공과대학 (신소재공학부)
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