Epitaxial KNbO3:Yb3+,Er3+ nanopattern for enhanced upconversion photoluminescence
- Authors
- Park, Heeyeon; Lee, Kyu-Tae; Kwon, Soon-Hong; Ahn, In Hwan; Kim, Byunghoon; Ko, Doo-Hyun; Kim, Woong
- Issue Date
- 15-1월-2020
- Publisher
- ELSEVIER SCIENCE SA
- Keywords
- Upconversion; Sol-gel; Epitaxy; Nanopattern; Nanoimprint
- Citation
- JOURNAL OF ALLOYS AND COMPOUNDS, v.813
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF ALLOYS AND COMPOUNDS
- Volume
- 813
- URI
- https://scholar.korea.ac.kr/handle/2021.sw.korea/58292
- DOI
- 10.1016/j.jallcom.2019.152238
- ISSN
- 0925-8388
- Abstract
- Nanopatterned epitaxial films of upconversion (UC) materials are desirable for various applications such as display lighting, waveguides, and optical imaging. In this study, we demonstrate that a nanopatterned epitaxial film of a UC material can be fabricated by combining a sol-gel process and nanoimprint lithography. An epitaxial KNbO3:Yb3+,Er3+ film is grown on a lattice-matched SrTiO3 single-crystal substrate, which exhibits an approximately 70 times enhanced UC photoluminescence (PL) intensity compared to that of a non-epitaxial KNbO3:Yb3+,Er3+ film grown on a Si substrate. Moreover, the introduction of a nanopattern enhances the UCPL intensity similar to 20 times compared to that of a planar film with the same volume of material. Our study paves the way for a better fundamental understanding and expansion in the application of UC materials. (C) 2019 Elsevier B.V. All rights reserved.
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Collections - College of Engineering > Department of Materials Science and Engineering > 1. Journal Articles
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